The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2007
Filed:
Jan. 04, 2005
Applicants:
Hiromoto Ohno, Kawasaki, JP;
Toshio Ohi, Tokyo, JP;
Inventors:
Hiromoto Ohno, Kawasaki, JP;
Toshio Ohi, Tokyo, JP;
Assignee:
Showa Denko K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 17/383 (2006.01); C07C 17/38 (2006.01);
U.S. Cl.
CPC ...
Abstract
A process for production of high-purity hexafluoroethane, wherein a mixed gas containing hexafluoroethane and chlorotrifluoromethane is reacted with hydrogen fluoride in a gas phase in the presence of a fluorination catalyst at 200–450° C., for fluorination of the chlorotrifluoromethane, or wherein pentafluoroethane containing chlorine compounds with 1–3 carbon atoms is reacted with hydrogen in a gas phase in the presence of a hydrogenation catalyst at 150–400° C., and the product is then reacted with fluorine in a gas phase in the presence of a diluent gas.