The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2007
Filed:
May. 11, 2006
Patrick Lacroix-desmazes, Montpellier, FR;
Romain Severac, Grabels, FR;
Bernard Boutevin, Montpellier, FR;
Vincent Bodart, Tavaux, FR;
Vincent Kurowski, Estaimbourg, BE;
Patrick Lacroix-Desmazes, Montpellier, FR;
Romain Severac, Grabels, FR;
Bernard Boutevin, Montpellier, FR;
Vincent Bodart, Tavaux, FR;
Vincent Kurowski, Estaimbourg, BE;
Solvay (Societe Anonyme), Brussels, BE;
Abstract
Radical polymerization process for the preparation of halogenated polymers employing one or more ethylenically unsaturated monomers, at least one of which is chosen from halogenated monomers, molecular iodine and one or more radical-generating agents chosen from diazo compounds, peroxides and dialkyl diphenylalkanes Radical polymerization process for the preparation, starting from the halogenated polymers prepared by the process as described above, of block copolymers, at least one block of which is a halogenated polymer block. Halogenated polymers which have a number-average molecular mass Mn of greater than 1.0×10and an Mz/Mw ratio of less than 1.65. Block copolymers, at least one block of which is a block of halogenated polymer identical to the halogenated polymers described above. Block copolymers comprising at least one halogenated polymer block which have a number-average molecular mass Mn of greater than 1.5×10and a polydispersity index Mw/Mn of less than 1.60.