The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 24, 2007

Filed:

Apr. 05, 2004
Applicants:

George G. Barclay, Jefferson, MA (US);

Stefan J. Caporale, Austin, TX (US);

Robert J. Kavanagh, Cambridge, MA (US);

Nick Pugliano, Grafton, MA (US);

Inventors:

George G. Barclay, Jefferson, MA (US);

Stefan J. Caporale, Austin, TX (US);

Robert J. Kavanagh, Cambridge, MA (US);

Nick Pugliano, Grafton, MA (US);

Assignee:

Shipley Company, L.L.C., Marlborough, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.


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