The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 24, 2007

Filed:

Jul. 15, 2003
Applicants:

Subhash Anand, Lancashire, GB;

Subbiyan Rajendran, Lancashire, GB;

Hiroaki Nakamura, Funabashi, JP;

Takanobu Aoyagi, Yokohama, JP;

Masatoshi Igarashi, Chiba, JP;

Inventors:

Subhash Anand, Lancashire, GB;

Subbiyan Rajendran, Lancashire, GB;

Hiroaki Nakamura, Funabashi, JP;

Takanobu Aoyagi, Yokohama, JP;

Masatoshi Igarashi, Chiba, JP;

Assignee:

ALCARE Co., Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61F 13/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a stretch fabric substrate for medical use in a simple knitted structure with a good productivity having such a desired elastic recovery of elongation that no reduction of the fabric substrate in the widthwise direction takes place when elongation is applied to a necessary extent in the lengthwise direction. The fabric substrate according to the present invention is constituted by means of a warp knit substrate, the warp knit substrate is formed by means of a chain stitch using a stretch multifilament textured yarn and elastic yarns and non-stretch yarns are inserted in the lengthwise direct ion and in the widthwise direction, respectively to the chain stitch.


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