The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2007

Filed:

Jan. 20, 2006
Applicants:

Kenji Yoneyama, Tokyo, JP;

Kazushi Tanaka, Tokyo, JP;

Mamoru Usami, Tokyo, JP;

Inventors:

Kenji Yoneyama, Tokyo, JP;

Kazushi Tanaka, Tokyo, JP;

Mamoru Usami, Tokyo, JP;

Assignee:

TDK Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 5/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed are an electron beam irradiation apparatus and an electron beam irradiation method that are capable of easily curing a material that is hard to be cured by irradiation of ultraviolet rays and of reducing the number of electron beam irradiation tubes. The electron beam irradiation apparatus has a motor for rotationally driving an irradiation target object, a shield container for rotatably accommodating the irradiation target object, and an electron beam irradiation unit provided in the shield container so that the surface of the irradiation target object is irradiated with electron beams, wherein the electron beam irradiation unit and the irradiation target object are relatively moved when the electron beam irradiation unit irradiates the surface of the irradiation target object with the electron beams during a rotation of the irradiation target object.


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