The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2007
Filed:
Nov. 12, 2003
Won B. Bang, Santa Clara, CA (US);
Yen-kun Wang, Fremont, CA (US);
Kevin Mikio Mukai, Santa Clara, CA (US);
Theresa Marie O. Liu, Sunnyvale, CA (US);
Won B. Bang, Santa Clara, CA (US);
Yen-Kun Wang, Fremont, CA (US);
Kevin Mikio Mukai, Santa Clara, CA (US);
Theresa Marie O. Liu, Sunnyvale, CA (US);
Applied Materials, Santa Clara, CA (US);
Abstract
A method of operating a substrate processing chamber comprising transferring a first substrate into the substrate processing chamber and heating the substrate to a first temperature of at least 510° C.; depositing an insulating layer over the first substrate while reducing the temperature of the substrate from the first temperature to a second temperature that is lower than the first temperature; transferring the first substrate out of the substrate processing chamber; removing unwanted deposition material formed on interior surfaces of the chamber during the depositing step by introducing reactive halogen species into the chamber while increasing the temperature of chamber; transferring a second substrate into the substrate processing chamber and heating the substrate to the first temperature; and depositing an insulating layer over the second substrate while reducing the temperature of the substrate from the first temperature to the second temperature.