The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2007
Filed:
Dec. 22, 2005
Ichirou Miyagawa, Kanagawa, JP;
Ichirou Miyagawa, Kanagawa, JP;
Fujifilm Corporation, Tokyo, JP;
Abstract
An exposure process is executed by multi-beams divided by polarizing and combining laser beams (La, Lb) modulated based on an image signal so as to be emitted by a light source side optical system by using a polarized light beam splitter, and by converting the laser beams (La, Lb) emitted as right circular polarized light and left circular polarized light into mutually orthogonal linear polarized light by using a quarter wave plate arranged on a light path of a scanning portion, and thereafter transmitting through an optical element of uniaxial crystal. An appropriate image can be formed by setting a division width of beam spots on a scanning surface set by the optical element of uniaxial crystal such that scanning unevenness of an image formed on a scanning surface is within an allowable range even when changing resolution of the inner drum exposure apparatus.