The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2007
Filed:
Dec. 09, 2004
Applicants:
Jongkook Park, Nashua, NH (US);
Jeffrey P. Sercel, Hollis, NH (US);
Patrick J. Sercel, Brentwood, NH (US);
Inventors:
Jongkook Park, Nashua, NH (US);
Jeffrey P. Sercel, Hollis, NH (US);
Patrick J. Sercel, Brentwood, NH (US);
Assignee:
J.P. Sercel Associates, Inc., Manchester, NH (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/22 (2006.01); H01L 21/30 (2006.01); H01L 21/46 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lift off process is used to separate a layer of material from a substrate by irradiating an interface between the layer of material and the substrate. According to one exemplary process, the layer is separated into a plurality of sections corresponding to dies on the substrate and a homogeneous beam spot is shaped to cover an integer number of the sections.