The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7202063 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 10, 2007

Filed:

Aug. 03, 2005
Applicants:

Nereus W. Gunther, Newtown Square, PA (US);

Daniel K. Y. Solaiman, Dresher, PA (US);

William F. Fett, Blue Bell, PA (US);

Inventors:

Nereus W. Gunther, Newtown Square, PA (US);

Daniel K. Y. Solaiman, Dresher, PA (US);

William F. Fett, Blue Bell, PA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C12P 7/64 (2006.01); C12P 19/02 (2006.01); C12P 17/02 (2006.01); C12N 1/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

A process for producing rhamnolipids involving culturingstrain NRRL B-30761 in a first aqueous culture medium containing about 0.3% NHHPO, about 0.2% KHPO, about 0.2% carbon source, about 0.5 mg/L FeSO, and about 0.1% MgSOfor about 24–about 48 hours at about 25°–about 30° C. with orbital shaking, and then culturingstrain NRRL B-30761 in a static second aqueous culture medium containing per liter about 2% carbon source, about 0.7 g KHPO, about 0.9 g NaHPO, about 2 g NaNO, about 0.4 g MgSO.7HO, and about 0.1 g CaCl.2HO for at least about 72 hours at about 20°–about 23° C., wherein the first and second aqueous culture medium contains only one source of carbon.


Find Patent Forward Citations

Loading…