The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2007
Filed:
Feb. 11, 2005
Qiang Wei, Novi, MI (US);
Ichiro Asano, Konan, JP;
Qiang Wei, Novi, MI (US);
Ichiro Asano, Konan, JP;
Horiba, Ltd., Kyoto, JP;
Abstract
A wide range continuous diluter for diluting gases that contain small particles to allow subsequent measurement of the diluted gases with an instrument is provided. A dilution gas inlet receives a dilution gas, and a sample gas inlet receives a sample gas. A flow meter measures the sample gas flow rate. A mixer receives and mixes the dilution gas and the sample gas at a dilution ratio. An instrument flow outlet provides a well-defined flow into the instrument from the mixture flow. A make-up gas inlet is arranged to provide make-up gas into the mixture flow at a controlled rate. Because the dilution gas flows at a controlled rate and the mixture flows at a controlled rate, changing the flow rate of the make-up gas causes a responsive change in the sample gas flow rate, thereby allowing continuous adjustment and control of the dilution ratio when desired.