The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2007

Filed:

Mar. 14, 2003
Applicants:

Wai Khaun Long, San Jose, CA (US);

Jin Ji, Sunnyvale, CA (US);

Inventors:

Wai Khaun Long, San Jose, CA (US);

Jin Ji, Sunnyvale, CA (US);

Assignee:

Huaya Microelectronics, Ltd, San Jose, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/40 (2006.01); G06K 9/32 (2006.01); G06K 9/48 (2006.01);
U.S. Cl.
CPC ...
Abstract

A digital image upscaling system enhances the visual quality of enlarged images by detecting diagonal edges and applying an appropriate scaling algorithm, such as a rotated bilinear scaling process, to output pixels associated with those edges. The rotated bilinear scaling process involves detecting diagonal edges and specifying a new frame of reference rotated 45° from the original frame of reference, and then selecting a rotated pixel set based on the new frame of reference. Bilinear interpolation in the new frame of reference using the rotated pixel set provides improved pixel data for the output pixel. Output pixels found not to be associated with diagonal edges are processed using standard bilinear interpolation.


Find Patent Forward Citations

Loading…