The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2007

Filed:

Jan. 12, 2004
Applicants:

Harry Levinson, Saratoga, CA (US);

Thomas White, Austin, TX (US);

Inventors:

Harry Levinson, Saratoga, CA (US);

Thomas White, Austin, TX (US);

Assignee:

Advanced Micro Devices Inc., Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01T 23/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

For clamping a reticle within a lithography system, a first area in the center of the reticle is clamped to a chuck of the lithography system at a first time point. In addition, a second area toward an outer perimeter of the reticle is clamped to the chuck at a second time point after the first time point such that the reticle is flattened against the chuck. With such flattening of the reticle, image placement error on a semiconductor substrate is minimized.


Find Patent Forward Citations

Levinson, Harry. (2007). Method and system for flattening a reticle within a lithography system (U.S. Patent No. 7199994). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7199994

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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