The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2007
Filed:
Sep. 16, 2004
Sang-hun Jang, Yongin-si, KR;
Hidekazu Hatanaka, Seongnam-si, KR;
Young-mo Kim, Suwon-si, KR;
Seong-eui Lee, Seongnam-si, KR;
Xiaoqing Zeng, Yongin-si, KR;
Kyung-min Chung, Yongin-si, KR;
Seung-hyun Son, Hwaseong-si, KR;
Gi-young Kim, Chungju-si, KR;
Hyoung-bin Park, Seongnam-si, KR;
Sang-Hun Jang, Yongin-si, KR;
Hidekazu Hatanaka, Seongnam-si, KR;
Young-Mo Kim, Suwon-si, KR;
Seong-Eui Lee, Seongnam-si, KR;
Xiaoqing Zeng, Yongin-si, KR;
Kyung-Min Chung, Yongin-si, KR;
Seung-Hyun Son, Hwaseong-si, KR;
Gi-Young Kim, Chungju-si, KR;
Hyoung-Bin Park, Seongnam-si, KR;
Samsung SDI Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Abstract
A plasma discharge method and a plasma display using the same. In the method, a sustain discharge uses a facing surfaces discharge and a surface discharge after an address discharge. The discharges occur in separate discharge areas, and priming particles generated by the discharges are exchanged. Thus, the stability and the efficiency of the sustain discharge increase, and a gap for the address discharge decreases to lower a breakdown voltage.