The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2007
Filed:
Sep. 30, 2005
Timothy J. Tredwell, Fairport, NY (US);
Lee W. Tutt, Webster, NY (US);
David B. Kay, Rochester, NY (US);
Yongtaek Hong, Webster, NY (US);
Glenn T. Pearce, Webster, NY (US);
Scott E. Phillips, Rochester, NY (US);
Timothy J. Tredwell, Fairport, NY (US);
Lee W. Tutt, Webster, NY (US);
David B. Kay, Rochester, NY (US);
Yongtaek Hong, Webster, NY (US);
Glenn T. Pearce, Webster, NY (US);
Scott E. Phillips, Rochester, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method for forming a resist pattern on a substrate () places a donor element () having a layer of thermoresist material proximate the substrate. A gap is maintained such that the surface of the layer of thermoresist material is spaced apart from the surface of the substrate by a number of spacing elements. Thermal energy is directed toward the donor element () according to the resist pattern, whereby a portion of thermoresist material is transferred from the donor element () across the gap by ablative transfer and is deposited onto the substrate () forming the resist pattern.