The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2007
Filed:
Oct. 26, 2005
Dietmar Sander, Geesthacht, DE;
Dietmar Sander, Geesthacht, DE;
Eppendorf AG, Hamburg, DE;
Abstract
Method for dosing liquid volumes, wherein a sample pickup portion with a pickup volume, the boundary of which is perforated with a liquid passage guiding to the outside and a gas passage, is dipped into a liquid with the liquid passage, a negative pressure is suddenly applied to the gas passage, which is generated by a gas displacement system, a drive of the gas displacement system is readjusted such that a constant negative working pressure exists in the sample pickup portion, the taken sample volume is detected with the aid of the readjusted driving path of the drive, the detected taken volume is compared with a predetermined value of the volume that is to be taken, when the predetermined value is reached by the taken volume, the negative pressure applied on the sample pickup portion is suddenly abated, the sample pickup portion with the liquid passage is pulled out of the liquid the sample pickup portion with the liquid passage is directed towards a releasing location, one ore more flow parameters is/are determined from the values of the taken volume, the negative working pressure and the time period required to take up the volume, an overpressure is applied to the gas passage of the sample pickup portion, the moment at which a volume that is to be released is released is determined with the aid of the flow parameter(s) and the overpressure, and when the moment is reached, the overpressure applied to the sample pickup portion is suddenly abated.