The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2007
Filed:
Jun. 07, 2005
Eigo Kawakami, Utsunomiya, JP;
Hirohisa Ota, Kawagoe, JP;
Takashi Nakamura, Tokyo, JP;
Kazuyuki Kasumi, Utsunomiya, JP;
Toshinobu Tokita, Yokohama, JP;
Eigo Kawakami, Utsunomiya, JP;
Hirohisa Ota, Kawagoe, JP;
Takashi Nakamura, Tokyo, JP;
Kazuyuki Kasumi, Utsunomiya, JP;
Toshinobu Tokita, Yokohama, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
Disclosed is a fine pattern forming apparatus and a fine pattern inspecting apparatus. In one preferred form, the fine pattern forming apparatus includes a surface irregularity information reading device for detecting a shape signal corresponding to a surface irregularity of a surface of an original, while scanning the surface by use of a first probe, and a surface irregularity information writing device for processing a substrate to be processed, while scanning a surface of the substrate by use of a second probe, wherein an applied electric voltage to the second probe is changed in accordance with the shape signal while a distance between the second probe and the substrate is kept substantially constant, or the distance between the second probe and the substrate is changed in accordance with the shape signal while the applied electric voltage to the second probe is kept substantially constant, such that the substrate is processed in accordance with the surface irregularity of the original.