The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2007
Filed:
Feb. 16, 2006
Baoquan Chen, Bothell, WA (US);
Timothy M. Londergan, Seattle, WA (US);
Baoquan Chen, Bothell, WA (US);
Timothy M. Londergan, Seattle, WA (US);
Lumera Corporation, Bothell, WA (US);
Abstract
A process comprising: a) reacting a diphenol monomer A with a monomer B having two locations for reaction with A to form arylene ether monomer C and b) reacting arylene ether monomer C with a diphenol monomer D to form a polymer, where monomer A isHX-Q-XH;  (II) monomer B is arylene ether monomer C is and monomer D is wherein: Qcomprises at least one aryl or heteroaryl group; Qcomprises at least one aryl or heteroaryl group; Xis O bonded directly to an aryl carbon of Q; Xis O bonded directly to an aryl carbon of Q; Z is a linker comprising at least one —(C(R))— group; Y is a single bond or linker group (e.g., comprising up to about 50 carbons); Ris independently at each occurrence H, a halogen, an alkyl group, a heteroalkyl group, an aryl group, or a heteroaryl group; Ris independently at each occurrence H, an alkyl group, or a heteroalkyl group; and Ris H or a crosslinkable group.