The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2007
Filed:
Jun. 27, 2003
Jozef Szlufcik, Kessel-Lo, BE;
Emmanuel Van Kerschaver, Wezemaal, BE;
Christophe Allebé, Orbais, BE;
Jozef Szlufcik, Kessel-Lo, BE;
Emmanuel Van Kerschaver, Wezemaal, BE;
Christophe Allebé, Orbais, BE;
Interuniversitair Microelektronica Centrum vzw, Leuven, BE;
Abstract
A method of etching a semiconductor substrate is described, the method comprising the steps of applying a paste containing an etchant to the substrate, and carrying out a thermal processing step to etch a part or a layer of the substrate where the paste has been applied. The etchant paste is preferably a caustic etching paste. The etchant paste may be applied selectively to a major surface of the substrate to form a pattern of applied paste. For example, the paste may be applied by a printing method, such as screen-printing. The method may be used to produce solar cells.