The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2007

Filed:

May. 29, 2003
Applicants:

Yuji Saito, Palo Alto, CA (US);

Friedrich B. Prinz, Woodside, CA (US);

Yong-il Park, Kyungbuk, KR;

Ryan O'hayre, Castle Rock, CO (US);

Inventors:

Yuji Saito, Palo Alto, CA (US);

Friedrich B. Prinz, Woodside, CA (US);

Yong-Il Park, Kyungbuk, KR;

Ryan O'Hayre, Castle Rock, CO (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01M 8/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

Dislocations are fabricated into electrolyte membrane films to increase ion conductivity. Ion and/or electron irradiation causes the growth of vacancy clusters within the thin film and collapsing into Frank dislocation loops that exhibit high ion conductivity. Maximum ion conductivity is accomplished by spatially reorienting the Frank dislocation loops during a following heat-treatment of the membrane. Thereby the dislocation loops form surface-to-surface continuous dislocations along which ions may propagate between membrane surfaces with minimal activation energies. Dislocation densities in the range of 10˜10cm/cmmay be fabricated with conventional irradiation techniques into ceramics such as, for example yttria stabilized zirconia and doped ceria.


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