The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2007

Filed:

Dec. 04, 2000
Applicant:

Babak Heidari, Furulund, SE;

Inventor:

Babak Heidari, Furulund, SE;

Assignee:

Obducat AB, Malmö{umlaut over ( )}, SE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B28B 1/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

Device in connection with the lithography of structures of nanometer size, which device comprises a first main part () with a first principally plane surface () and a second main part () with a second principally plane surface (), said first surface and second surface being opposite to one another and being arranged in principle parallel in relation to one another, with an adjustable interval between them, and said first and second surface being arranged to form a support for a substrate () and a template () respectively, or vice-versa. According to the invention, said second main part () also comprises a cavity () for a medium, and means for adjusting a pressure of said medium, a wall of said cavity consisting of a flexible membrane (), of which one side, which side faces away from the cavity (), forms said second surface (). The invention also relates to a method that utilizes the device.


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