The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2007
Filed:
Aug. 31, 2005
Applicants:
Boguslaw A. Swedek, San Jose, CA (US);
Manoocher Birang, Los Gatos, CA (US);
Nils Johansson, Los Gatos, CA (US);
Inventors:
Boguslaw A. Swedek, San Jose, CA (US);
Manoocher Birang, Los Gatos, CA (US);
Nils Johansson, Los Gatos, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B24B 49/00 (2006.01); B24B 51/00 (2006.01); B24B 1/00 (2006.01); B24B 19/00 (2006.01); G01H 3/12 (2006.01); G01N 9/24 (2006.01);
U.S. Cl.
CPC ...
Abstract
A chemical mechanical polishing apparatus and method can use an eddy current monitoring system and an optical monitoring system. Signals from the monitoring systems can be combined on an output line and extracted by a computer. A thickness of a polishing pad can be calculated. The eddy current monitoring system and optical monitoring system can measure substantially the same location on the substrate.