The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2007
Filed:
Feb. 16, 2004
Applicants:
Michihiko Takase, Ikoma, JP;
Jun Shinozaki, Kyotanabe, JP;
Hiroyuki Furukawa, Takatsuki, JP;
Inventors:
Assignee:
Matsushita Electric Industrial Co., Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05C 13/00 (2006.01); H01J 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention relates to a process for manufacturing plasma display panel and a substrate holder, preventing an occurrence of dust giving an unfavorable effect in a forming process of a film on a substrate of a plasma display panel in a film forming apparatus. When forming the film, a substrate () and a dummy substrate () are held by a first substrate holder () composed of a supporter sustaining underneath the substrate and a restrictor restricting a position of the substrates () in a plane direction, and a second substrate holder () sustaining the first substrate holder ().