The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2007

Filed:

Mar. 16, 2005
Applicants:

Kenji Otsuka, Kanagawa, JP;

Naoki Muranaga, Kanagawa, JP;

Kikurou Takemoto, Hyogo, JP;

Inventors:

Kenji Otsuka, Kanagawa, JP;

Naoki Muranaga, Kanagawa, JP;

Kikurou Takemoto, Hyogo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B /27 (2006.01); A62D 3/00 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

There are disclosed a production apparatus for producing a gallium nitride semiconductor film by HVPE process, a cleaning apparatus for cleaning exhaust gas coming from the above apparatus and an overall production plant for producing a gallium nitride semiconductor by HVPE process. Therein exhaust piping for exhaust gas in the production apparatus, introduction piping for the cleaning apparatus and exhaust gas piping which connects the production apparatus and the cleaning apparatus are each composed of an electroconductive corrosion-resistant material and are each electrically grounded, thereby surely preventing electrostatic charging due to friction between ammonium chloride powders in the exhaust gas and inside walls of exhaust gas piping, and markedly enhancing operational safety.


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