The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2007
Filed:
Feb. 20, 2003
Young-min Min, Seongnam-si, KR;
Dae-kyu Choi, Suwon-si, KR;
Do-in Bae, Changwon-si, KR;
Yun-sik Yang, Suwon-si, KR;
Wan-goo Hwang, Yongin-si, KR;
Jin-man Kim, Yongin-si, KR;
Young-Min Min, Seongnam-si, KR;
Dae-Kyu Choi, Suwon-si, KR;
Do-In Bae, Changwon-si, KR;
Yun-Sik Yang, Suwon-si, KR;
Wan-Goo Hwang, Yongin-si, KR;
Jin-Man Kim, Yongin-si, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
A method for generating a plasma. A gas flows along a flow path having the displacement identical to the lines of magnetic force of the main magnetic field, and high frequency alternating current is applied to the gas, thereby generating a gas plasma. For example, a gas is flowed through a pipe in a first direction. Electricity is conducted through the pipe in substantially the first direction. And a magnetic field is applied along a second direction (e.g., perpendicular to the first direction) to the gas flowing in the pipe such that a plasma is induced in the pipe.