The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 20, 2007

Filed:

Mar. 08, 2004
Applicants:

Han Cheol Ryu, Seoul, KR;

Seungeon Moon, Daejeon, KR;

Min Hwan Kwak, Jinju, KR;

Su Jae Lee, Daejeon, KR;

Sang Seok Lee, Daejeon, KR;

Young Tae Kim, Seoul, KR;

Inventors:

Han Cheol Ryu, Seoul, KR;

Seungeon Moon, Daejeon, KR;

Min Hwan Kwak, Jinju, KR;

Su Jae Lee, Daejeon, KR;

Sang Seok Lee, Daejeon, KR;

Young Tae Kim, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01P 1/18 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided are a distributed analog phase shifter and a method of manufacturing the same, which reduce a change in a characteristic impedance while changing a phase velocity with respect to an applied voltage. In the distributed analog phase shifter, a coplanar waveguide (CPW) is formed in a line form on a substrate. A plurality of ferroelectric capacitors is periodically loaded to the CPW. The ferroelectric capacitors include a ferroelectric film in a pattern form and defines the ferroelectric film affected by the applied voltage within an area of the ferroelectric capacitors. Accordingly, the change in the phase velocity with respect to the applied voltage is maintained without the change of the CPW characteristic and a return loss characteristic and a total insertion loss are improved since a total dielectric loss of the ferroelectric film is decreased.


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