The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2007
Filed:
Sep. 27, 2004
Gregory A. Roche, Fort Collins, CO (US);
Leonard J. Mahoney, Fort Collins, CO (US);
Daniel C. Carter, Fort Collins, CO (US);
Steven J. Roberts, Severance, CO (US);
Gregory A. Roche, Fort Collins, CO (US);
Leonard J. Mahoney, Fort Collins, CO (US);
Daniel C. Carter, Fort Collins, CO (US);
Steven J. Roberts, Severance, CO (US);
Advanced Plasma, Inc., Santa Clara, CA (US);
Abstract
There is provided by this invention a wafer probe for measuring plasma and surface characteristics in plasma processing environment that utilizes integrated sensors on a wafer substrate. A microprocessor mounted on the substrate receives input signals from the integrated sensors to process, store, and transmit the data. A wireless communication transceiver receives the data from the microprocessor and transmits information outside of the plasma processing system to a computer that collects the data during plasma processing. The integrated sensors may be dual floating Langmuir probes, temperature measuring devices, resonant beam gas sensors, or hall magnetic sensors. There is also provided a self-contained power source that utilizes the plasma for power that is comprised of a topographically dependent charging device or a charging structure that utilizes stacked capacitors.