The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2007
Filed:
Oct. 07, 2002
David Franz, Sevelen, CH;
Johann Karner, Feldkirch, AT;
David Franz, Sevelen, CH;
Johann Karner, Feldkirch, AT;
Abstract
The present invention relates to a method for diamond coating of substrates in which the substrate is exposed in a vacuum atmosphere to a reactive gas mixture excited by means of a plasma discharge, the plasma discharge comprising a plasma beam () in an evacuated receiver () that is formed between a cathode chamber () and an anode (), and the reactive gas mixture comprising a reactive gas and a working gas, the reactive gas in () and the working gas in () and/or () introduced into the receiver, and the receiver () is evacuated by a pump arrangement (), and the hydrogen concentration of the reactive gas mixture being 0–45 vol. %.