The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2007
Filed:
Apr. 04, 2006
Schultz Gregory Lee, Naples, FL (US);
Ed A. Schlairet, Naples, FL (US);
Edward H. Harrison, Goodland, FL (US);
Schultz Gregory Lee, Naples, FL (US);
Ed A. Schlairet, Naples, FL (US);
Edward H. Harrison, Goodland, FL (US);
Haynes Corporation, Naples, FL (US);
Abstract
A modified pump follower device () and method of retarding injection timing of EMD-type unit injectors by a desired amount of crank degrees includes the steps of providing a modified pump follower () whose plunger engagement location, also known as t-slot (), varies depending on the desired amount of retarding. Specifically, the modified pump follower () has a t-slot () which has a predetermined distance t' on the modified pump follower (), as compared to conventional pump followers having a predetermined distance t, such that the t-slot () is closer to the top face () of the pump follower (). The difference in spacing between the original timing t and the retarded timing t′ is r, which is an amount equal to the amount of retardation, in linear units, that corresponds to the desired amount of retardation in crank degrees.