The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2007
Filed:
Mar. 05, 2004
Applicants:
Lingadahalli G. Shantharama, Penfield, NY (US);
John A. Lebens, Rush, NY (US);
Thomas M. Stephany, Churchville, NY (US);
Inventors:
Lingadahalli G. Shantharama, Penfield, NY (US);
John A. Lebens, Rush, NY (US);
Thomas M. Stephany, Churchville, NY (US);
Assignee:
Eastman Kodak Company, Rochester, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B21D 53/76 (2006.01); G01D 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for creating an inkjet chamber. The method comprises the steps of firstly providing a substrate having a nozzle opening and secondly etching the substrate through the nozzle opening by alternating between anisotropic and isotropic etching processes for forming a chamber having a shape approximating a cylinder by using multiple hemispheric etches.