The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 20, 2007

Filed:

Aug. 13, 2004
Applicants:

Cherngye Hwang, San Jose, CA (US);

Kim Y. Lee, Fremont, CA (US);

Gary Mcclelland, Palo Alto, CA (US);

Dennis Richard Mckean, Milpitas, CA (US);

Timothy Clark Reiley, San Jose, CA (US);

Inventors:

Cherngye Hwang, San Jose, CA (US);

Kim Y. Lee, Fremont, CA (US);

Gary McClelland, Palo Alto, CA (US);

Dennis Richard McKean, Milpitas, CA (US);

Timothy Clark Reiley, San Jose, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/127 (2006.01); H04R 31/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for manufacturing thin-film magnetic head sliders is disclosed. Initially, an elastic layer, which may be made of poly-dimethyl siloxane (PDMS), is spun on a wafer and is thermally cured. Then, a resist layer is spun on the elastic layer. Both the resist layer and the elastic layer are subsequently peeled off together from the wafer. Next, the peeled resist layer/elastic layer is applied onto a group of magnetic heads with the resist layer in direct contact with the magnetic heads. Finally, the elastic layer is peeled off from the resist layer such that the resist layer remains attaching to the magnetic heads.


Find Patent Forward Citations

Loading…