The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2007
Filed:
Jul. 08, 2004
Stephan Kudelka, Ottendorf-Okrilla, DE;
Albrecht Kieslich, Radebeul, DE;
Kevin Pears, Dreseden, DE;
Infineon Technologies AG, Munich, DE;
Abstract
A method for fabricating a trench structure, in particular a trench capacitor with an insulation collar, which is electrically connected to a substrate on one side via a buried contact. Fabrication includes, for example, providing a trench in the substrate using a hard mask with a corresponding mask opening; providing an at least partial trench filling; providing a liner on the resulting structure; carrying out an oblique implantation of impurity ions onto the liner for altering the etching properties of an implanted partial region of the liner; selectively removing the implanted partial region of the liner by a first etching for forming a liner mask from the complimentary partial region of the liner, which partially masks the top side of the trench filling; removing a part of the trench filling by a second etching using the liner mask; and replacing the removed part of the trench filling.