The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2007
Filed:
Mar. 14, 2002
Mark Tuominen, Shutesbury, MA (US);
Mustafa Bal, Amherst, MA (US);
Thomas P. Russell, Amherst, MA (US);
Andrei Ursache, Amherst, MA (US);
Mark Tuominen, Shutesbury, MA (US);
Mustafa Bal, Amherst, MA (US);
Thomas P. Russell, Amherst, MA (US);
Andrei Ursache, Amherst, MA (US);
University of Massachusetts, Boston, MA (US);
Abstract
Pathways to rapid and reliable fabrication of three-dimensional nanostructures are provided. Simple methods are described for the production of well-ordered, multilevel nanostructures. This is accomplished by patterning block copolymer templates with selective exposure to a radiation source. The resulting multi-scale lithographic template can be treated with post-fabrication steps to produce multilevel, three-dimensional, integrated nanoscale media, devices, and systems.