The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2007
Filed:
May. 21, 2003
Method and device for cleaning raw material gas introduction tube used in cvd film forming apparatus
Kenichi Hama, Kawasaki, JP;
Tsuyoshi Kage, Kashiwa, JP;
Takumi Kobayashi, Singapore, SG;
Takeharu Kawabe, Matsudo, JP;
Kenichi Hama, Kawasaki, JP;
Tsuyoshi Kage, Kashiwa, JP;
Takumi Kobayashi, Singapore, SG;
Takeharu Kawabe, Matsudo, JP;
Mitsubishi Shoji Plastics Corporation, Tokyo, JP;
Youtec Co., Ltd., Nagareyama, JP;
Kirin Brewery Company, Limited, Tokyo, JP;
Abstract
A method and apparatus for cleaning a source gas introduction pipe, which can prevent strong adhesion of contaminant mainly containing carbon powder on an outer surface of the source gas introduction pipe to easily remove the contaminant in a short period of time. While compressed air is sprayed toward the contaminant, the contaminant removed by the spray of the compressed air is exhausted outside a system of a deposition chamber by suction and exhausting device so that the contaminant is not transferred to sides of the deposition chamber and a plastic container in which a CVD film is formed, in a process for extracting the source gas introduction pipe from the plastic container after the CVD film is formed on an inner surface of the plastic container.