The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2007
Filed:
Nov. 12, 2002
Masayuki Naya, Kaisei-machi, JP;
Mitsuru Sawano, Kaisei-machi, JP;
Shu Sato, Kaisei-machi, JP;
Toshihito Kimura, Kaisei-machi, JP;
Hitoshi Shimizu, Kaisei-machi, JP;
Masayuki Naya, Kaisei-machi, JP;
Mitsuru Sawano, Kaisei-machi, JP;
Shu Sato, Kaisei-machi, JP;
Toshihito Kimura, Kaisei-machi, JP;
Hitoshi Shimizu, Kaisei-machi, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
In a measuring method utilizing the phenomenon of attenuation in total internal reflection in which a light beam is caused to enter a dielectric block provided with a film layer to be brought into contact with a sample so that total internal reflection conditions are satisfied at the interface of the dielectric block and the film layer and various angles of incidence of the light beam to the interface of the dielectric block and the film layer can be obtained, and the intensity of the light beam reflected in total internal reflection at the interface is detected, the light beam is caused to intermittently impinge upon the dielectric block.