The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2007

Filed:

Jul. 23, 2004
Applicants:

Naoto Fuse, Utsunomiya, JP;

Hiroshi Ito, Fuchu, JP;

Makoto Mizuno, Utsunomiya, JP;

Inventors:

Naoto Fuse, Utsunomiya, JP;

Hiroshi Ito, Fuchu, JP;

Makoto Mizuno, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 41/04 (2006.01); H01L 41/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a positioning mechanism and an exposure apparatus that can be used in a vacuum ambience and has a damping function with small degassing and small dust creation. A positioning mechanism according to the present invention, when used with first and second members, serve to position the second member with respect to the first member, wherein the positioning mechanism include a positioning portion capable of relatively positioning the second member relative to the first member, and an attenuating material provided at least at a portion of a periphery of the positioning portion.


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