The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2007
Filed:
Feb. 27, 2004
Yun-jung Jee, Yongin-si, KR;
Sun-yong Choi, Sungnam-si, KR;
Chung-sam Jun, Suwon-si, KR;
Kwan-woo Ryu, Suwon-si, KR;
Yun-Jung Jee, Yongin-si, KR;
Sun-Yong Choi, Sungnam-si, KR;
Chung-Sam Jun, Suwon-si, KR;
Kwan-Woo Ryu, Suwon-si, KR;
Samsung Electronics Co. Ltd., Suwon-si, KR;
Abstract
A method of monitoring a density profile of impurities, the method including presetting a monitoring position of a thin layer coated on a substrate, the density profile of impurities being monitored from the monitoring position in a direction of thickness of the thin layer, moving an exposer for exposing a local area of the thin layer to the monitoring position, exposing the local area of the thin layer along the direction of thickness of the thin layer, forming a shape profile of the exposed local area of the thin layer, and monitoring the density profile of impurities by determining a density of impurities in accordance with the shape profile, and an apparatus therefor. The impurity density profile may be monitored without destroying a substrate on which a thin layer is coated, and an amount of impurities used for forming the thin layer may be monitored and controlled in real-time.