The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2007
Filed:
Oct. 01, 2004
Willi-kurt Gries, B2640 Mortsel, BE;
Marc Van Damme, B2640 Mortsel, BE;
Pascal Meeus, B2640 Mortsel, BE;
Mario Boxhorn, B2640 Mortsel, BE;
Willi-Kurt Gries, B2640 Mortsel, BE;
Marc Van Damme, B2640 Mortsel, BE;
Pascal Meeus, B2640 Mortsel, BE;
Mario Boxhorn, B2640 Mortsel, BE;
Other;
Abstract
The invention relates to an alkaline developer for irradiated radiation sensitive compositions, which developer is based on water and at least one inorganic salt having an alkaline reaction, wherein the developer has a pH of at least 11 and comprises at least three structurally different surfactants of formulae (A), (B) and (C), characterised in that the surfactant of formula (A) has one anionic group, the surfactant of formula (B) has two anionic groups, the surfactant of formula (C) is non-ionic and has at least one non-ionic hydrophilic group, and the concentration of each of the surfactants of formulae (A), (B) and (C) in the developer is at least 0.05 weight-% based on the total weight of the developer. The developer leads to less depositions and has a superior stability when used.