The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2007

Filed:

Jun. 03, 2005
Applicants:

Anthony P. Kitson, Evans, CO (US);

Kevin B. Ray, Fort Collins, CO (US);

Socrates P. Pappas, Midland, TX (US);

Celin Savariar-hauck, Badenhausen, DE;

Inventors:

Anthony P. Kitson, Evans, CO (US);

Kevin B. Ray, Fort Collins, CO (US);

Socrates P. Pappas, Midland, TX (US);

Celin Savariar-Hauck, Badenhausen, DE;

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/11 (2006.01); G03F 7/14 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

Multilayer, positive working, thermally imageable, bakeable imageable elements have a substrate, an underlayer, and a top layer. The underlayer comprises a polymeric material that comprises, in polymerized form from about 5 mol % to about 30 mol % of recurring units derived from an ethylenically unsaturated polymerizable monomer having a carboxy group; from about 20 mol % to about 75 mol % of recurring units derived from N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, or a mixture thereof; and from about 3 mol % to about 50 mol % of recurring units derived from a compound represented by the formula:CH═C(R)—C(O)—NH—CH—OR,in which Ris Cto Calkyl, phenyl, Cto Csubstituted phenyl, Cto Caralkyl, or Si(CH); and Ris hydrogen or methyl. Other materials, such as a resin or resins having activated methylol and/or activated alkylated methylol groups, such as a resole resin, may be present in the underlayer. The elements can be used to produce bakeable lithographic printing plates that are resistant to press chemistries.


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