The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2007
Filed:
Mar. 09, 2004
Ki Hwan Park, Suwon-Si, KR;
Jong Kook Song, Suwon-Si, KR;
MO Hyun Cho, Suwon-Si, KR;
Sung-ho JO, Kunggi-Do, KR;
Sun Jae Lee, Suwon-Si, KR;
Pyung Ho Lim, Osan-Si, KR;
Dong Wook Cho, Daegu-Kyongyuksi, KR;
Ki Hwan Park, Suwon-Si, KR;
Jong Kook Song, Suwon-Si, KR;
Mo Hyun Cho, Suwon-Si, KR;
Sung-Ho Jo, Kunggi-Do, KR;
Sun Jae Lee, Suwon-Si, KR;
Pyung Ho Lim, Osan-Si, KR;
Dong Wook Cho, Daegu-Kyongyuksi, KR;
Abstract
A method for cleaning and drying semiconductor wafers improves device yield by providing more advanced control of the ratio of drying fluid to cleaning fluid, for example the ratio of N2 vapor to IPA vapor. In addition, a quick drain process is employed to improve process throughput, and to further improve particle and watermark removal during the cleaning and drying steps.