The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2007
Filed:
Jun. 18, 2004
Gary J. Swanson, Lexington, MA (US);
Lyle Shirley, Boxborough, MA (US);
William John Hubbard, Litchfield, NH (US);
Robert Cleveland Abbe, Newton, MA (US);
Gary J. Swanson, Lexington, MA (US);
Lyle Shirley, Boxborough, MA (US);
William John Hubbard, Litchfield, NH (US);
Robert Cleveland Abbe, Newton, MA (US);
Dimensional Photonics International, Inc., Wilmington, MA (US);
Abstract
The present invention provides a method and apparatus for reducing error in interferometric fringe stability and reproducibility in an interference fringe generator. In one aspect, the method for reducing error in interferometric fringe stability and reproducibility includes providing a light source, positioning a grating to receive light from the light source and positioning a projection lens having a focal length F to receive light from the grating. The projection lens projects the received light upon an object of interest positioned substantially at a distance dfrom the lens. Typically the lens is positioned substantially at a distance dfrom the grating. The values of d, d, and F are related by dbeing approximately equal to dF/(d−F).