The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2007
Filed:
Feb. 18, 2005
Seiji Samukawa, Sendai, JP;
Seiji Samukawa, Sendai, JP;
Semiconductor Technology Academic Research Center, Yokohama, JP;
Abstract
A real-time monitoring apparatus for a plasma process comprises a plurality of measuring units () mounted on a semiconductor wafer, a receiving device () for receiving a signal transmitted from each of the measuring units (), and a data processing apparatus () for detecting a condition of the semiconductor wafer () based on the received signal. In this apparatus, each of the measuring units () includes at least one plasma process detection sensor (), a light-emitting device () for converting an output of the plasma process detection sensor into an optical output, and a power supply () for supplying drive power to the light-emitting device ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile