The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2007
Filed:
Dec. 15, 2003
Applicants:
Charles D. Hoke, Menlo Park, CA (US);
Peter R. Robrish, San Francisco, CA (US);
Rene P. Helbing, Palo Alto, CA (US);
Ken A. Nishimura, Fremont, CA (US);
Inventors:
Charles D. Hoke, Menlo Park, CA (US);
Peter R. Robrish, San Francisco, CA (US);
Rene P. Helbing, Palo Alto, CA (US);
Ken A. Nishimura, Fremont, CA (US);
Assignee:
Agilent Technologies, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02F 1/1333 (2006.01);
U.S. Cl.
CPC ...
Abstract
Embodiments of the invention involve UV resistant liquid crystal cells. One embodiment of the invention is to increase the volume of the liquid crystal material that is stored inside the cell. For example, trenches may be used to provide reservoirs that hold the additional liquid crystal material. The inventive cell can be used as a SLM in photolithographic imaging systems.