The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2007
Filed:
Dec. 06, 2005
Hyun-kyung Yoon, Seoul, KR;
Won-ho Lee, Daejeon, KR;
Jong-hyun Chae, Daejeon, KR;
Dong-il Lee, Dongducheon-si, KR;
Hyun-kyung Yoon, Seoul, KR;
Won-ho Lee, Daejeon, KR;
Jong-hyun Chae, Daejeon, KR;
Dong-il Lee, Dongducheon-si, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
The present invention relates to a method for preparing high-purity terephthalaldehyde from terephthalaldehyde crystal containing impurities by recrystallization using an antisolvent. Low-purity terephthalaldehyde prepared by a conventional method, which contains a small amount of impurities, is dissolved in a solvent and recrystallized using water as antisolvent to obtain high-purity terephthalaldehyde. The invention is significantly advantageous in using water only as antisolvent. Also, the purification process takes short time and is economical and environment-friendly.