The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2007
Filed:
Nov. 03, 2004
Applicants:
Richard Stelter, Buford, GA (US);
Aron Welk, Tracy, CA (US);
Christopher Padua, Campbell, CA (US);
Chun LI, Plainview, NY (US);
Inventors:
Richard Stelter, Buford, GA (US);
Aron Welk, Tracy, CA (US);
Christopher Padua, Campbell, CA (US);
Chun Li, Plainview, NY (US);
Assignee:
Dexter Magnetic Technologies, Inc., Fremont, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
Abstract
The magnet arrangement and resulting rotating sputtering magnetron design of an embodiment provides magnetic flux density and distribution to penetrate thick production ferrous targets. Further, the magnetic field shape improves target life by more uniformly removing target material.