The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2007
Filed:
Sep. 16, 2005
Applicants:
Dean R. Garraffa, Newport Coast, CA (US);
Douglas J. Toth, San Clemente, CA (US);
Inventors:
Dean R. Garraffa, Newport Coast, CA (US);
Douglas J. Toth, San Clemente, CA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61F 9/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
A dive mask having a pair of replaceable lenses comprises a soft, flexible skirt for bearing against the diver's face, an inner lens frame having a pair of openings for receiving the lenses and a peripheral member integrally molded into the skirt for permanent retention therein and a removable outer lens frame having a pair of lens openings and a peripheral member shaped to bear against the lenses adjacent the skirt. A sealing gasket is preferable molded into the inner lens frame along the lens openings to prevent water leakage into the face side of the lenses.