The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2007
Filed:
Sep. 24, 2004
Hideyuki Eguchi, Tokyo, JP;
Takashi Yoshii, Tokyo, JP;
Hiroshi Sugimura, Tokyo, JP;
Akira Tamura, Tokyo, JP;
Hideyuki Eguchi, Tokyo, JP;
Takashi Yoshii, Tokyo, JP;
Hiroshi Sugimura, Tokyo, JP;
Akira Tamura, Tokyo, JP;
Toppan Printing Co., Ltd., Tokyo, JP;
Abstract
A method of dividing a circuit pattern for creating complementary stencil masks corresponding to complementary patterns, the method comprising a step of dividing a circuit pattern into a plurality of complementary patterns including a first complementary pattern comprising a pattern of a cantilevered beam member having a support portion width Wand a length L, and a second complementary pattern comprising a pattern of a both end-supported beam member having a support portion width Wand a length L. The dividing of the circuit pattern is performed in a manner that a aspect ratio A(L/W) of the pattern of the cantilevered beam member is confined to not more than 100, and that a aspect ratio A(L/W) of the pattern of the both end-supported beam member is confined to not more than 150.