The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2007
Filed:
Mar. 25, 2004
Applicant:
Edward Raymond Dowski, Jr., Lafayette, CO (US);
Inventor:
Edward Raymond Dowski, Jr., Lafayette, CO (US);
Assignee:
CDM Optics, Inc., Boulder, CO (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 27/14 (2006.01); G02B 13/18 (2006.01); G02B 3/02 (2006.01);
U.S. Cl.
CPC ...
Abstract
An optical system with mechanical adjustment provides for the rotation and/or translation of one or more optical phase filters to variably select an extended depth of field, aberration-tolerance, and/or anti-aliasing properties of an optical imaging system. By adjusting the amount of phase induced on the wavefront, a user may select image quality selectively. The system may further automatically counter change of focus and/or aperture to maintain substantially constant image properties. Typically, two phase filters are used and moved concurrently to achieve desired image properties.