The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2007

Filed:

Aug. 09, 2004
Applicants:

Keiichi Umeda, Omihachiman, JP;

Hajime Yamada, Otsu, JP;

Yoshimitsu Ushimi, Ishikawa-ken, JP;

Daisuke Nakamura, Ishikawa-ken, JP;

Inventors:

Keiichi Umeda, Omihachiman, JP;

Hajime Yamada, Otsu, JP;

Yoshimitsu Ushimi, Ishikawa-ken, JP;

Daisuke Nakamura, Ishikawa-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H03H 9/00 (2006.01); H01L 41/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An insulating film including an aluminum nitride film is provided on a support substrate to be supported thereby. Then, a lower electrode, a piezoelectric thin film, and an upper electrode are provided in that order on the aluminum nitride film. The piezoelectric film is disposed between the lower electrode and the upper electrode which oppose each other. Furthermore, the aluminum nitride film is subjected to a plasma treatment in an oxygen-containing atmosphere to form an oxide layer on the aluminum nitride film, the oxide layer being made smoother than the aluminum nitride film.


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