The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2007
Filed:
Nov. 01, 2004
Koji Asakawa, Kanagawa-ken, JP;
Akira Fujimoto, Kanagawa-ken, JP;
Hitoshi Sugiyama, Kanagawa-ken, JP;
Kenichi Ohashi, Kanagawa-ken, JP;
Kenji Suzuki, Kanagawa-ken, JP;
Junichi Tonotani, Kanagawa-ken, JP;
Koji Asakawa, Kanagawa-ken, JP;
Akira Fujimoto, Kanagawa-ken, JP;
Hitoshi Sugiyama, Kanagawa-ken, JP;
Kenichi Ohashi, Kanagawa-ken, JP;
Kenji Suzuki, Kanagawa-ken, JP;
Junichi Tonotani, Kanagawa-ken, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A nanometer size roughened structure is formed on a surface of a light-emitting element, and luminous efficiency is improved. The roughened structure on the surface of the light-emitting element of the invention is formed into the following shape such that the refractive index smoothly changes: The surface of such light-emitting element is obtained by forming a thin film on the surface of the light-emitting element using a resin composition which contains a block copolymer or graft copolymer and forms a micophase-separated structure in a self-organization manner; selectively removing at least one phase of the microphase-separated structure of the thin film formed on the surface; and etching the surface of the light-emitting element using the remaining phase as an etching mask.