The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 20, 2007

Filed:

Mar. 31, 2004
Applicants:

Craig I. Walker, Frenchs Forest, AU;

Aleksander S. Roudnev, De Forest, WI (US);

Inventors:

Craig I. Walker, Frenchs Forest, AU;

Aleksander S. Roudnev, De Forest, WI (US);

Assignee:

Weir Slurry Group, Inc., Madison, WI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F04D 29/24 (2006.01);
U.S. Cl.
CPC ...
Abstract

In accordance with the present invention, an impeller for use in a centrifugal pump has at least one vane the radially outer terminal end of which is configured to produce a flow velocity profile that controls and reduces the wear caused by slurry fluid being expelled from the impeller on the inner surface of the pump casing. The impeller vanes of the present invention are generally configured with a radially outwardly extending portion, as compared with the conventional straight or concave edge of an impeller vane. The outwardly extending portion may vary in shape, but is selected to produce a flow velocity profile that reduces wear in the pump casing.


Find Patent Forward Citations

Loading…